Multilayer film formation device (Polyparaxylene + ALD)
We alternately stack polyparaxylylene (Parylene) and inorganic oxide layers using atomic layer deposition (ALD).
Parylene is a high-performance resin with biocompatibility, but it has the disadvantage of lower gas barrier properties compared to inorganic oxides. Therefore, by alternately depositing Parylene and oxides like a sandwich, it becomes possible to create high-performance films with excellent barrier properties, making it ideal for medical applications that require miniaturization and thin films. Parylene and ALD can be deposited in the same chamber (in-situ) without breaking the vacuum, so there is no concern about particles. Additionally, manufacturers have process know-how, so information regarding recipes can also be provided. We also conduct demonstration film deposition, so please feel free to contact us.
- Company：マツボー
- Price：Other
